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IEICE Trans

Bashir AHMMAD

Low-Temperature Atomic Layer Deposition of AlN Using Trimethyl Aluminum and Plasma Excited Ar Diluted Ammonia
Kentaro SAITO Kazuki YOSHIDA Masanori MIURA Kensaku KANOMATA Bashir AHMMAD Shigeru KUBOTA Fumihiko HIROSE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2022/10/01
Vol. E105-C  No. 10  pp. 596-603
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
low-temperature atomic layer deposition, aluminum nitride, plasma excited ammonia, 
 Summary | Full Text:PDF
Low-Temperature Deposition of Yttrium Oxide on Flexible PET Films Using Time-Separated Yttrium Precursor and Oxidizer Injections
Kentaro SAITO Kazuki YOSHIDA Masanori MIURA Kensaku KANOMATA Bashir AHMMAD Shigeru KUBOTA Fumihiko HIROSE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2022/10/01
Vol. E105-C  No. 10  pp. 604-609
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
low-temperature deposition, yttrium oxide, plasma excited humidified argon, 
 Summary | Full Text:PDF
Room Temperature Atomic Layer Deposition of Nano Crystalline ZnO and Its Application for Flexible Electronics
Kazuki YOSHIDA Kentaro SAITO Keito SOGAI Masanori MIURA Kensaku KANOMATA Bashir AHMMAD Shigeru KUBOTA Fumihiko HIROSE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2021/07/01
Vol. E104-C  No. 7  pp. 363-369
Type of Manuscript:  PAPER
Category: Electronic Materials
Keyword: 
room temperature process, atomic layer deposition, crystallization, ZnO, 
 Summary | Full Text:PDF
Room-Temperature Atomic Layer Deposition of SnO2 Using Tetramethyltin and Its Application to TFT Fabrication
Kentaro TOKORO Shunsuke SAITO Kensaku KANOMATA Masanori MIURA Bashir AHMMAD Shigeru KUBOTA Fumihiko HIROSE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2018/05/01
Vol. E101-C  No. 5  pp. 317-322
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
ALD, SnO2, IR absorption spectroscopy, TFT, 
 Summary | Full Text:PDF
Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
P. Pungboon PANSILA Kensaku KANOMATA Bashir AHMMAD Shigeru KUBOTA Fumihiko HIROSE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2015/05/01
Vol. E98-C  No. 5  pp. 382-389
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
Gallium oxide, trimethylgallium, remote plasma, IR absorption spectroscopy, adsorption, oxidization, 
 Summary | Full Text:PDF
Nitrogen Adsorption of Si(100) Surface by Plasma Excited Ammonia
P. Pungboon PANSILA Kensaku KANOMATA Bashir AHMMAD Shigeru KUBOTA Fumihiko HIROSE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2015/05/01
Vol. E98-C  No. 5  pp. 395-401
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
Plasma, plasma excited NH3, IR absorption spectroscopy, XPS, 
 Summary | Full Text:PDF