Kentaro TOKORO


Room-Temperature Atomic Layer Deposition of SnO2 Using Tetramethyltin and Its Application to TFT Fabrication
Kentaro TOKORO Shunsuke SAITO Kensaku KANOMATA Masanori MIURA Bashir AHMMAD Shigeru KUBOTA Fumihiko HIROSE 
Publication:   
Publication Date: 2018/05/01
Vol. E101-C  No. 5  pp. 317-322
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
ALDSnO2IR absorption spectroscopyTFT
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