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Vol.E77-C No.3
pp.379-384
Special SectionPAPER
Device Technology
Highly Reliable Ultra-Thin Tantalum Oxide Capacitors for ULSI DRAMs
Satoshi KAMIYAMA, Hiroshi SUZUKI, Pierre-Yves LESAICHERRE, Akihiko ISHITANI, |
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Summary | Full Text:PDF | |
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Vol.E77-C No.3
pp.385-391
Special SectionPAPER
Device Technology
(Ba0.75Sr0.25)TiO3 Films for 256 Mbit DRAM
Tsuyoshi HORIKAWA, Noboru MIKAMI, Hiromi ITO, Yoshikazu OHNO, Tetsuro MAKITA, Kazunao SATO, |
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Summary | Full Text:PDF | |
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Vol.E77-C No.3
pp.392-398
Special SectionPAPER
Device Technology
Application of Ferroelectric Thin Films to Si Devices
Koji ARITA, Eiji FUJII, Yasuhiro SHIMADA, Yasuhiro UEMOTO, Masamichi AZUMA, Shinichiro HAYASHI, Toru NASU, Atsuo INOUE, Akihiro MATSUDA, Yoshihisa NAGANO, Shin-ich KATSU, Tatsuo OTSUKI, Gota KANO, Larry D. McMILLAN, Carlos A. Paz de ARAUJO, |
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Summary | Full Text:PDF | |
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Vol.E77-C No.3
pp.399-405
Special SectionPAPER
Device Technology
Soft-Error Study of DRAMs with Retrograde Well Structure by New Evaluation Method
Yoshikazu OHNO, Hiroshi KIMURA, Ken-ichiro SONODA, Tadashi NISHIMURA, Shin-ichi SATOH, Hirokazu SAYAMA, Shigenori HARA, Mikio TAKAI, Hirokazu MIYOSHI, |
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Summary | Full Text:PDF | |
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Vol.E77-C No.3
pp.406-415
Special SectionPAPER
Device Technology
Design Rule Relaxation Approach for High-Density DRAMs
Takanori SAEKI, Eiichiro KAKEHASHI, Hidemitu MORI, Hiroki KOGA, Kenji NODA, Mamoru FUJITA, Hiroshi SUGAWARA, Kyoichi NAGATA, Shozo NISHIMOTO, Tatsunori MUROTANI, |
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Summary | Full Text:PDF | |
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Vol.E77-C No.3
pp.416-424
Special SectionPAPER
Process Technology
New Technologies of KrF Excimer Laser Lithography System in 0.25 Micron Complex Circuit Patterns
Masaru SASAGO, Takahiro MATSUO, Kazuhiro YAMASHITA, Masayuki ENDO, Kouji MATSUOKA, Taichi KOIZUMI, Akiko KATSUYAMA, Noboru NOMURA, |
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Summary | Full Text:PDF | |
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Vol.E77-C No.3
pp.425-431
Special SectionPAPER
Process Technology
Optimization of Optical Parameters in KrF Excimer Laser Lithography for Quarter-Micron Lines Pattern
Keiichiro TOUNAI, Kunihiko KASAMA, |
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Summary | Full Text:PDF | |
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Vol.E77-C No.3
pp.432-437
Special SectionPAPER
Process Technology
High Performance Lithography with Advanced Modified Illumination
Ho-Young KANG, Cheol-Hong KIM, Joong-Hyun LEE, Woo-Sung HAN, Young-Bum KOH, |
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Summary | Full Text:PDF | |
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Vol.E77-C No.3
pp.438-444
Special SectionPAPER
Process Technology
Enhancement of Defocus Characteristics with Intermediate Phase Interference in Phase Shift Method
Hiroshi OHTSUKA, Toshio ONODERA, Kazuyuki KUWAHARA, Takashi TAGUCHI, |
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Summary | Full Text:PDF | |
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Vol.E77-C No.3
pp.445-452
Special SectionPAPER
Process Technology
High Speed Electron Beam Cell Projection Exposure System
Yoshihiko OKAMOTO, Norio SAITOU, Haruo YODA, Yoshio SAKITANI, |
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Summary | Full Text:PDF | |
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