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IEICE Trans

Keyword : resist

Stochastic Modeling and Local CD Uniformity Comparison between Negative Metal-Based, Negative- and Positive-Tone Development EUV Resists
Itaru KAMOHARA Ulrich WELLING Ulrich KLOSTERMANN Wolfgang DEMMERLE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2022/01/01
Vol. E105-C  No. 1 ; pp. 35-46
Type of Manuscript:  PAPER
Category: Semiconductor Materials and Devices
Keyword: 
stochastic model calibration, LCDU, metal-oxide-resist, polymer, mask tone, resist, EUV, NTD, 
 Summary | Full Text:PDF
Improvement of ArF Photo Resist Pattern by VUV Cure
Hisakazu MIYATAKE Takashi ITO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2007/05/01
Vol. E90-C  No. 5 ; pp. 1006-1011
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: Lithography-Related Techniques
Keyword: 
UV cure, ArF, resist, dry etching resistance, LER, 
 Summary | Full Text:PDF
New Technologies of KrF Excimer Laser Lithography System in 0.25 Micron Complex Circuit Patterns
Masaru SASAGO Takahiro MATSUO Kazuhiro YAMASHITA Masayuki ENDO Kouji MATSUOKA Taichi KOIZUMI Akiko KATSUYAMA Noboru NOMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/03/25
Vol. E77-C  No. 3 ; pp. 416-424
Type of Manuscript:  Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
lithography, resist, excimer laser, off-axis illumination, curing, 
 Summary | Full Text:PDF
Quarter Micron KrF Excimer Laser Lithography
Masaru SASAGO Masayuki ENDO Yoshiyuki TANI Satoshi KOBAYASHI Taichi KOIZUMI Takahiro MATSUO Kazuhiro YAMASHITA Noboru NOMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/04/25
Vol. E76-C  No. 4 ; pp. 582-587
Type of Manuscript:  Special Section PAPER (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
lithography, resist, excimer laser, anti-reflection, 
 Summary | Full Text:PDF
Recent Progress in KrF Excimer Laser Lithography
Makoto NAKASE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/01/25
Vol. E76-C  No. 1 ; pp. 26-31
Type of Manuscript:  INVITED PAPER (Special Issue on Opto-Electronics and LSI)
Category: Opto-Electronics Technology for LSIs
Keyword: 
lithography, stepper, excimer laser, resist, semiconductor device, 
 Summary | Full Text:PDF