Keyword : anti-reflection


Quarter Micron KrF Excimer Laser Lithography
Masaru SASAGO Masayuki ENDO Yoshiyuki TANI Satoshi KOBAYASHI Taichi KOIZUMI Takahiro MATSUO Kazuhiro YAMASHITA Noboru NOMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/04/25
Vol. E76-C  No. 4 ; pp. 582-587
Type of Manuscript:  Special Section PAPER (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
lithographyresistexcimer laseranti-reflection
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