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IEICE Trans

Keyword : silicon nitride

All-Optical Modulation Format Conversions from PAM4 to QPSK and 16QAM Using Silicon-Rich Nitride Waveguides
Yuto FUJIHARA Asahi SUEYOSHI Alisson RODRIGUES DE PAULA Akihiro MARUTA Ken MISHINA 
Publication:   IEICE TRANSACTIONS on Communications
Publication Date: 2023/11/01
Vol. E106-B  No. 11 ; pp. 1074-1083
Type of Manuscript:  Special Section PAPER (Joint Special Section on Opto-electronics and Communications for Future Optical Network)
Category: 
Keyword: 
optical signal processing, optical modulation, silicon photonics, silicon nitride, 
 Summary | Full Text:PDF
Enhancement of the Programming Speed in SANOS Nonvolatile Memory Device Designed Utilizing Al2O3 and SiO2 Stacked Tunneling Layers
Hyun Woo KIM Dong Hun KIM Joo Hyung YOU Tae Whan KIM 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2010/05/01
Vol. E93-C  No. 5 ; pp. 651-653
Type of Manuscript:  BRIEF PAPER
Category: Memory Devices
Keyword: 
SANOS, SONOS, charge transport, silicon nitride, stacked tunneling layer, 
 Summary | Full Text:PDF
Effects of Various Rare Earth Sesquioxide Additives on Grain Growth in Millimeter-Wave Sintered Silicon Nitride Ceramics
Masayuki HIROTA Maria-Cecilia VALECILLOS Manuel E. BRITO Kiyoshi HIRAO Motohiro TORIYAMA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2003/12/01
Vol. E86-C  No. 12 ; pp. 2462-2468
Type of Manuscript:  Special Section PAPER (Special Issue on Recent Trends on Microwave and Millimeter Wave Application Technology)
Category: Millimeter-Wave Heating
Keyword: 
silicon nitride, millimeter-wave, microstructure, sintering, grain growth, 
 Summary | Full Text:PDF
Direct Photo Chemical Vapor Deposition of Silicon Nitride and Its Application to MIS Structre
Masahiro YOSHIMOTO Kenji TAKUBO Takashi SAITO Tetsuya OHTSUKI Michio KOMODA Hiroyuki MATSUNAMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/09/25
Vol. E75-C  No. 9 ; pp. 1019-1024
Type of Manuscript:  Special Section PAPER (Special Issue on Silicon Devices and Materials)
Category: 
Keyword: 
direct photo-CVD, silicon nitride, MIS structure, interface states, rapid thermal anneal, 
 Summary | Full Text:PDF