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Improvement of ArF Photo Resist Pattern by VUV Cure Hisakazu MIYATAKE Takashi ITO | Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 2007/05/01
Vol. E90-C
No. 5
pp. 1006-1011
Type of Manuscript:
Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices) Category: Lithography-Related Techniques Keyword: UV cure, ArF, resist, dry etching resistance, LER, | | | Summary | Full Text:PDF | |
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Sequential Dry Cleaning System for Highly-Controlled Silicon Surfaces Takashi ITO | Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C
No. 3
pp. 375-381
Type of Manuscript:
Special Section PAPER (Special Issue on Scientific ULSI Manufacturing Technology) Category: High-Performance Processing Keyword: ULSI, clean surface, native oxide, photo-excitation, hydrogen termination, | | | Summary | Full Text:PDF | |
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FOREWORD Takashi ITO | Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 1992/12/25
Vol. E75-C
No. 12
pp. 1413-1414
Type of Manuscript:
FOREWORD Category: Keyword:
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FOREWORD Takashi ITO | Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 1991/06/25
Vol. E74-C
No. 6
pp. 1607-1608
Type of Manuscript:
FOREWORD Category: Keyword:
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