Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 1994/03/25
Vol. E77-C
No. 3 ;
pp. 480-485
Type of Manuscript:
Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies)
Category: Process Technology
Keyword:
Ti, TiSi2, salicide, subquarter-micron CMOS, gate resistance, |
