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Vol.E75-C No.9
pp.971-971
FOREWORD
FOREWORD
Hiroyuki MATSUNAMI, |
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Vol.E75-C No.9
pp.972-977
Special SectionPAPER
Half-Micron LOCOS Isolation Using High Energy Ion Implantation
Koji SUZUKI, Kazunobu MAMENO, Hideharu NAGASAWA, Atsuhiro NISHIDA, Hideaki FUJIWARA, Kiyoshi YONEDA, |
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Vol.E75-C No.9
pp.978-985
Special SectionPAPER
Characterization of a Silicon Wafer after the Removal of Photoresist Layer Using Two Lasers of Different Wavelengths
Akira USAMI, Hideki FUJIWARA, Takahisa NAKAI, Kazunori MATSUKI, Tsutomu TAKEUCHI, Takao WADA, |
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Vol.E75-C No.9
pp.986-989
Special SectionPAPER
Quantitative Analysis of Submonolayer Si on Ge Surface by Isotope Dilution Secondary Ion Mass Spectrscopy
Izumi KAWASHIMA, Yasuo TAKAHASHI, Tsuneo URISU, |
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Vol.E75-C No.9
pp.990-994
Special SectionPAPER
Evaluation of Surface Damage on a Silicon Wafer Induced by Reactive Ion Etching Using X-Ray Photoeloctron Spectroscopy and Electrical Characteristics
Akitaka MURATA, Morio NAKAMURA, Akira ASAI, Ichiro TANIGUCHI, |
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Vol.E75-C No.9
pp.995-1000
Special SectionPAPER
Diffusion of Phosphorus in Poly/Single Crystalline Silicon
Hideaki FUJIWARA, Hideharu NAGASAWA, Atsuhiro NISHIDA, Koji SUZUKI, Kazunobu MAMENO, Kiyoshi YONEDA, |
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Vol.E75-C No.9
pp.1001-1006
Special SectionPAPER
Characterization of Buried Si Atomic Structures by High-Energy Ion Scattering Technique
Eiji KAMIYA, Jong MOON, Toshimichi ITO, Akio HIRAKI, |
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Vol.E75-C No.9
pp.1007-1012
Special SectionPAPER
Effects of the Gate Polycrystalline Silicon Film on the Characteristics of MOS Capacitor
Makoto AKIZUKI, Masaki HIRASE, Atsushi SAITA, Hiroyuki AOE, Atsumasa DOI, |
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Vol.E75-C No.9
pp.1013-1018
Special SectionPAPER
Deposition of High-Quality Silicon Dioxide by Remote Plasma CVD Technique
Takashi FUYUKI, Takeshi FURUKAWA, Tohru OKA, Hiroyuki MATSUNAMI, |
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Vol.E75-C No.9
pp.1019-1024
Special SectionPAPER
Direct Photo Chemical Vapor Deposition of Silicon Nitride and Its Application to MIS Structre
Masahiro YOSHIMOTO, Kenji TAKUBO, Takashi SAITO, Tetsuya OHTSUKI, Michio KOMODA, Hiroyuki MATSUNAMI, |
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