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Vol.E79-C No.3
pp.312-316
Special SectionPAPER
Particle/Defect Control and Analysis
Particle Growth Caused by Film Deposition in VLSI Manufacturing Process
Yoshimasa TAKII, Yuichi MIYOSHI, Yuichi HIROFUJI, |
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Summary | Full Text:PDF | |
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Vol.E79-C No.3
pp.317-323
Special SectionPAPER
Particle/Defect Control and Analysis
High-Resolution Wafer Inspection Using the "in-lens SEM"
Fumio MIZUNO, Satoru YAMADA, Tadashi OHTAKA, Nobuo TSUMAKI, Toshifumi KOIKE, |
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Summary | Full Text:PDF | |
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Vol.E79-C No.3
pp.324-327
Special SectionPAPER
Particle/Defect Control and Analysis
Observation Techinique for Process-Induced Defects Using Anodic Oxidation
Morio INOUE, Shinji FUJII, |
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Summary | Full Text:PDF | |
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Vol.E79-C No.3
pp.328-336
Special SectionPAPER
Particle/Defect Control and Analysis
Neutralization of Static Electricity by Soft X-Ray and Vacuum Ultraviolet(UV)-Ray Irradiation
Hitoshi INABA, Tadahiro OHMI, Takanori YOSHIDA, Takao OKADA, |
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Summary | Full Text:PDF | |
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Vol.E79-C No.3
pp.337-342
Special SectionPAPER
High-Performance Processing
Issues of Wet Cleaning in ULSI Process
Tsuneo AJIOKA, Mayumi SHIBATA, Yasuo MIZOKAMI, |
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Summary | Full Text:PDF | |
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Vol.E79-C No.3
pp.343-362
Special SectionPAPER
High-Performance Processing
A Model for the Electrochemical Deposition and Removal of Metallic Impurities on Si Surfaces
Hitoshi MORINAGA, Makoto SUYAMA, Masashi NOSE, Steven VERHAVERBEKE, Tadahiro OHMI, |
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Summary | Full Text:PDF | |
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Vol.E79-C No.3
pp.363-374
Special SectionPAPER
High-Performance Processing
Advanced Fluorite Regeneration Technology to Recover Spent Fluoride Chemicals Drained from Semi-conductor Manufacturing Process
Nobuhiro MIKI, Matagoro MAENO, Toshiro FUKUDOME, Tadahiro OHMI, |
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Summary | Full Text:PDF | |
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Vol.E79-C No.3
pp.375-381
Special SectionPAPER
High-Performance Processing
Sequential Dry Cleaning System for Highly-Controlled Silicon Surfaces
Takashi ITO, |
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Summary | Full Text:PDF | |
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Vol.E79-C No.3
pp.382-384
Special SectionLETTER
High-Performance Processing
Improvement of Etching Selectivity to Photoresist for Al Dry Etching by Using Ion Implantation
Keiichi UEDA, Kiyoshi SHIBATA, Kazunobu MAMENO, |
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Summary | Full Text:PDF | |
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Vol.E79-C No.3
pp.385-391
Special SectionPAPER
Cr2O3 Passivated Gas Tubing System for Specialty Gases
Yasuyuki SHIRAI, Masaki NARAZAKI, Tadahiro OHMI, |
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Summary | Full Text:PDF | |
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Current List: 37791 - 37800
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