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Vol.E79-B No.3
pp.424-431 PAPER
Optical Communication Semiconductor Laser's Nonlinearity Compensation for DS-CDMA Optical Transmission System by Post Nonlinearity Recovery Block Pervez RAZIQ, Masao NAKAGAWA, |
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Vol.E79-C No.3
pp.255-255 FOREWORD
FOREWORD Tadahiro OHMI, |
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Vol.E79-C No.3
pp.256-263 INVITED PAPER
Significance of Ultra Clean Technology in the Era of ULSIs Takahisa NITTA, |
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Vol.E79-C No.3
pp.264-271 INVITED PAPER
Sizes and Numbers of Particles Being Capable of Causing Pattern Defects in Semiconductor Device Manufacturing Mototaka KAMOSHIDA, Hirotomo INUI, Toshiyuki OHTA, Kunihiko KASAMA, |
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Vol.E79-C No.3
pp.272-276 Special SectionPAPER
CIM/CAM Database with LSI Failure Analysis Navigator Takahiro ITO, Tadao TAKEDA, Shigeru NAKAJIMA, |
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Vol.E79-C No.3
pp.277-281 Special SectionPAPER
CIM/CAM Yield Prediction Method Considering the Effect of Particles on Sub-Micron Patterning Nobuyoshi HATTORI, Masahiko IKENO, Hitoshi NAGATA, |
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Vol.E79-C No.3
pp.282-289 Special SectionPAPER
CIM/CAM Unified Process Flow Management System for ULSI Semiconductor Manufacturing Etsuo FUKUDA, |
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Vol.E79-C No.3
pp.290-300 Special SectionPAPER
CIM/CAM Simulation System for Resource Planning and Line Performance Evaluation of ASIC Manufacturing Lines Shinji NAKAMURA, Chisato HASHIMOTO, Akira SHINDO, Osamu MORI, Junro NOSE, |
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Vol.E79-C No.3
pp.301-305 Special SectionPAPER
CIM/CAM A New Cost Model, CPO, for the Evaluation of FAB Performance Yukiko ITO, Hajime OGAWA, Hiromichi TANI, |
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Vol.E79-C No.3
pp.306-311 Special SectionPAPER
Particle/Defect Control and Analysis Control of Fine Particulate and Gaseous Contaminants by UV/Photoelectron Method Takafumi SETO, Shin YOKOYAMA, Kikuo OKUYAMA, Masataka HIROSE, Toshiaki FUJII, Hidetomo SUZUKI, |
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Current List: 37781 - 37790
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