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| Keyword : process simulation
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Three-Dimensional Triangle-Based Simulation of Etching Processes and Applications
Oliver LENHART Eberhard BAR | Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 2003/03/01
Vol. E86-C
No. 3 ;
pp. 427-432
Type of Manuscript:
Special Section PAPER (Special Issue on the 2002 IEEE International Conference on Simulation of Semiconductor Processes and Devices (SISPAD'02))
Category:
Keyword:
process simulation, etching, 3D string algorithm, surface mesh, | | | Summary | Full Text:PDF | |
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TCAD--Yesterday, Today and Tomorrow
Robert W. DUTTON | Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 1999/06/25
Vol. E82-C
No. 6 ;
pp. 791-799
Type of Manuscript:
INVITED PAPER (Special Issue on TCAD for Semiconductor Industries)
Category:
Keyword:
TCAD, device simulation, process simulation, IC technology, diffusion, ion implantation, oxidation, MOS scaling, modeling, hierarchy, atomic-scale phenomena, | | | Summary | Full Text:PDF | |
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