Eberhard BAR


Three-Dimensional Triangle-Based Simulation of Etching Processes and Applications
Oliver LENHART Eberhard BAR 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2003/03/01
Vol. E86-C  No. 3  pp. 427-432
Type of Manuscript:  Special Section PAPER (Special Issue on the 2002 IEEE International Conference on Simulation of Semiconductor Processes and Devices (SISPAD'02))
Category: 
Keyword: 
process simulationetching3D string algorithmsurface mesh
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Control and Improvement of Surface Triangulation for Three-Dimensional Process Simulation
Eberhard BAR Jurgen LORENZ 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2000/08/25
Vol. E83-C  No. 8  pp. 1338-1342
Type of Manuscript:  Special Section PAPER (Special Issue on 1999 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD'99))
Category: Numerics
Keyword: 
semiconductor technologyprocess simulationsurface triangulationgrid generation
 Summary | Full Text:PDF