Oliver LENHART


Three-Dimensional Triangle-Based Simulation of Etching Processes and Applications
Oliver LENHART Eberhard BAR 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2003/03/01
Vol. E86-C  No. 3  pp. 427-432
Type of Manuscript:  Special Section PAPER (Special Issue on the 2002 IEEE International Conference on Simulation of Semiconductor Processes and Devices (SISPAD'02))
Category: 
Keyword: 
process simulationetching3D string algorithmsurface mesh
 Summary | Full Text:PDF