The Influence of High-Temperature Sputtering on the N-Doped LaB6 Thin Film Formation Utilizing RF Sputtering Kyung Eun PARKShun-ichiro OHMI
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 2020/06/01 Vol. E103-CNo. 6 ;
pp. 293-298 Type of Manuscript: Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices) Category: Electronic Materials Keyword: N-doped LaB6, MOS diode, Schottky diode, effective work function, RF sputtering,