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IEICE Trans

Keyword : RF magnetron sputtering

MFSFET with 5nm Thick Ferroelectric Nondoped HfO2 Gate Insulator Utilizing Low Power Sputtering for Pt Gate Electrode Deposition
Joong-Won SHIN Masakazu TANUMA Shun-ichiro OHMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2022/10/01
Vol. E105-C  No. 10 ; pp. 578-583
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
ferroelectric, 5nm thick nondoped HfO2, RF magnetron sputtering, Pt gate electrode, PMA process, 
 Summary | Full Text:PDF
The Effect of Inter Layers on the Ferroelectric Undoped HfO2 Formation
Masakazu TANUMA Joong-Won SHIN Shun-ichiro OHMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2022/10/01
Vol. E105-C  No. 10 ; pp. 584-588
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
ferroelectric HfO2, RF magnetron sputtering, Hf inter layer, chemical oxide inter layer, 
 Summary | Full Text:PDF
Etching Control of HfN Encapsulating Layer for PtHf-Silicide Formation with Dopant Segregation Process
Shun-ichiro OHMI Yuya TSUKAMOTO Rengie Mark D. MAILIG 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2019/06/01
Vol. E102-C  No. 6 ; pp. 453-457
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
PtHf-alloy silicide, PtHf-alloy target, selective etching, contact resistivity, dopant segregation, RF magnetron sputtering, 
 Summary | Full Text:PDF
PdEr-Silicide Formation and Contact Resistivity Reduction to n-Si(100) Realized by Dopant Segregation Process
Shun-ichiro OHMI Yuya TSUKAMOTO Weiguang ZUO Yasushi MASAHIRO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2018/05/01
Vol. E101-C  No. 5 ; pp. 311-316
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
PdEr-alloy target, silicide, schottky barrier height, contact resistivity, RF magnetron sputtering, 
 Summary | Full Text:PDF
PdYb-Silicide with Low Schottky Barrier Height to n-Si Formed from Pd/Yb/Si(100) Stacked Structures
Shun-ichiro OHMI Mengyi CHEN Weiguang ZUO Yasushi MASAHIRO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2017/05/01
Vol. E100-C  No. 5 ; pp. 458-462
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
PdYb-silicide, contact resistivity, Schottky barrier height, stacked layer, RF magnetron sputtering, 
 Summary | Full Text:PDF
PtHf Silicide Formation Utilizing PtHf-Alloy Target for Low Contact Resistivity
Shun-ichiro OHMI Mengyi CHEN Xiaopeng WU Yasushi MASAHIRO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2016/05/01
Vol. E99-C  No. 5 ; pp. 510-515
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
PtHf-alloy target, PtHf-alloy silicide, contact resistivity, Schottky barrier height, RF magnetron sputtering, 
 Summary | Full Text:PDF
Fabrication of Rugate Optical Filters Using a-SiOx:H Thin Films
Hidehiko YODA Koichi MURO Kazuo SHIRAISHI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2008/10/01
Vol. E91-C  No. 10 ; pp. 1639-1643
Type of Manuscript:  Special Section PAPER (Special Section on Functional Thin Films for Optical Applications)
Category: 
Keyword: 
rugate optical filter, a-SiOxH thin film, RF magnetron sputtering, ripple, 
 Summary | Full Text:PDF