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IEICE Trans

Yoshifumi SAITOU

Estimation of Optimum Ion Energy for the Reduction of Resistivity in Bias Sputtering of ITO Thin Films
Kiyoshi ISHII Yoshifumi SAITOU Kengo FURUTANI Hiroshi SAKUMA Yoshito IKEDA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2008/10/01
Vol. E91-C  No. 10  pp. 1653-1657
Type of Manuscript:  Special Section PAPER (Special Section on Functional Thin Films for Optical Applications)
Category: 
Keyword: 
tin-doped indium oxide, transparent thin film, ITO, sputtered film, gas flow sputtering, 
 Summary | Full Text:PDF