Keyword : gas flow sputtering


Estimation of Optimum Ion Energy for the Reduction of Resistivity in Bias Sputtering of ITO Thin Films
Kiyoshi ISHII Yoshifumi SAITOU Kengo FURUTANI Hiroshi SAKUMA Yoshito IKEDA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2008/10/01
Vol. E91-C  No. 10 ; pp. 1653-1657
Type of Manuscript:  Special Section PAPER (Special Section on Functional Thin Films for Optical Applications)
Category: 
Keyword: 
tin-doped indium oxidetransparent thin filmITOsputtered filmgas flow sputtering
 Summary | Full Text:PDF

High-Rate Deposition of Titanium Dioxide Films with Photocatalytic Activities by Gas Flow Sputtering
Kiyoshi ISHII Kazunari KUROKAWA Sachio YOSHIHARA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2004/02/01
Vol. E87-C  No. 2 ; pp. 232-237
Type of Manuscript:  Special Section PAPER (Special Section on Recent Progress in Oxide Thin Films by Sputtering)
Category: 
Keyword: 
titanium dioxide filmphotocatalytic activitysputtered filmgas flow sputtering
 Summary | Full Text:PDF