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IEICE Trans

Masayuki ENDO

New Technologies of KrF Excimer Laser Lithography System in 0.25 Micron Complex Circuit Patterns
Masaru SASAGO Takahiro MATSUO Kazuhiro YAMASHITA Masayuki ENDO Kouji MATSUOKA Taichi KOIZUMI Akiko KATSUYAMA Noboru NOMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/03/25
Vol. E77-C  No. 3  pp. 416-424
Type of Manuscript:  Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
lithography, resist, excimer laser, off-axis illumination, curing, 
 Summary | Full Text:PDF
Quarter Micron KrF Excimer Laser Lithography
Masaru SASAGO Masayuki ENDO Yoshiyuki TANI Satoshi KOBAYASHI Taichi KOIZUMI Takahiro MATSUO Kazuhiro YAMASHITA Noboru NOMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/04/25
Vol. E76-C  No. 4  pp. 582-587
Type of Manuscript:  Special Section PAPER (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
lithography, resist, excimer laser, anti-reflection, 
 Summary | Full Text:PDF