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IEICE Trans

Kenta NAKAMURA

Technology Mapping Technique for Increasing Throughput of Character Projection Lithography
Makoto SUGIHARA Kenta NAKAMURA Yusuke MATSUNAGA Kazuaki MURAKAMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2007/05/01
Vol. E90-C  No. 5  pp. 1012-1020
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: Lithography-Related Techniques
Keyword: 
maskless lithography, character projection, variable-shaped beam, technology mapping, throughput, 
 Summary | Full Text:PDF
Cell Library Development Methodology for Throughput Enhancement of Character Projection Equipment
Makoto SUGIHARA Taiga TAKATA Kenta NAKAMURA Ryoichi INANAMI Hiroaki HAYASHI Katsumi KISHIMOTO Tetsuya HASEBE Yukihiro KAWANO Yusuke MATSUNAGA Kazuaki MURAKAMI Katsuya OKUMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2006/03/01
Vol. E89-C  No. 3  pp. 377-383
Type of Manuscript:  Special Section PAPER (Special Section on VLSI Design Technology in the Sub-100 nm Era)
Category: CAD
Keyword: 
cell library, character projection, electron beam, EB shots, throughput, optimization, integer linear programming, 
 Summary | Full Text:PDF