Cell Library Development Methodology for Throughput Enhancement of Character Projection Equipment

Makoto SUGIHARA  Taiga TAKATA  Kenta NAKAMURA  Ryoichi INANAMI  Hiroaki HAYASHI  Katsumi KISHIMOTO  Tetsuya HASEBE  Yukihiro KAWANO  Yusuke MATSUNAGA  Kazuaki MURAKAMI  Katsuya OKUMURA  

IEICE TRANSACTIONS on Electronics   Vol.E89-C    No.3    pp.377-383
Publication Date: 2006/03/01
Online ISSN: 1745-1353
DOI: 10.1093/ietele/e89-c.3.377
Print ISSN: 0916-8516
Type of Manuscript: Special Section PAPER (Special Section on VLSI Design Technology in the Sub-100 nm Era)
Category: CAD
cell library,  character projection,  electron beam,  EB shots,  throughput,  optimization,  integer linear programming,  

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We propose a cell library development methodology for throughput enhancement of character projection equipment. First, an ILP (Integer Linear Programming)-based cell selection is proposed for the equipment for which both of the CP (Character Projection) and VSB (Variable Shaped Beam) methods are available, in order to minimize the number of electron beam (EB) shots, that is, time to fabricate chips. Secondly, the influence of cell directions on area and delay time of chips is examined. The examination helps to reduce the number of EB shots with a little deterioration of area and delay time because unnecessary directions of cells can be removed. Finally, a case study is shown in which the numbers of EB shots are shown for several cases.