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Vol.E75-C No.7
pp.781-789
Special SectionPAPER
Synchrotron Radiation Stimulated Evaporation of a-SiO2 Films and Its Application for Si Surface Cleaning
Housei AKAZAWA, Yuichi UTSUMI, Jun-ichi TAKAHASHI, Tsuneo URISU, |
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Vol.E75-C No.7
pp.790-795
Special SectionPAPER
The Effect of Chemical Cleaning on Bulk Traps in Dry Gate Oxide
Hidetsugu UCHIDA, Norio HIRASHITA, Tsuneo AJIOKA, |
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Summary | Full Text:PDF | |
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Vol.E75-C No.7
pp.796-799
Special SectionPAPER
Effects of Cleaning by Sulfuric Acid and Hydroperoxide Mixture on Thin SiO2 Film Properties
Masashi MAEKAWA, Shigeo OHNISHI, Keizo SAKIYAMA, |
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Summary | Full Text:PDF | |
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Vol.E75-C No.7
pp.800-808
Special SectionPAPER
Influence of Vacancy in Silicon Wafer of Various Types on Surface Microroughness in Wet Chemical Process
Tadahiro OHMI, Toshihito TSUGA, Jun TAKANO, Masahiko KOGURE, Koji MAKIHARA, Takayuki IMAOKA, |
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Summary | Full Text:PDF | |
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Vol.E75-C No.7
pp.809-811
Special SectionPAPER
Evaluation of Si Surface Micro-Roughness by Measuring Chlorine Concentration and Total Charge of Native Oxide
Ichiro OKI, Tetsuo BIWA, Jun KUDO, Hikou SHIBAYAMA, |
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Summary | Full Text:PDF | |
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Vol.E75-C No.7
pp.812-815
Special SectionPAPER
A New Cleaning Solution for Metallic Impurities on the Silicon Wafer Surface
Tsugio SHIMONO, Mikio TSUJI, |
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Summary | Full Text:PDF | |
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Vol.E75-C No.7
pp.816-828
Special SectionPAPER
The Segregation and Removal of Metallic Impurities at the Interface of Silicon Wafer Surface and Liquid Chemicals
Takashi IMAOKA, Takehiko KEZUKA, Jun TAKANO, Isamu SUGIYAMA, Tadahiro OHMI, |
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Summary | Full Text:PDF | |
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Vol.E75-C No.7
pp.829-833
Special SectionPAPER
Removal of Fe and Al on a Silicon Surface Using UV-Excited Dry Cleaning
Rinshi SUGINO, Yoshiko OKUI, Masaki OKUNO, Mayumi SHIGENO, Yasuhisa SATO, Akira OHSAWA, Takashi ITO, |
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Summary | Full Text:PDF | |
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Vol.E75-C No.7
pp.834-838
Special SectionPAPER
Plasmaless Dry Etching of Silicon Nitride Films with Chlorine Trifluoride Gas
Yoji SAITO, Masahiro HIRABARU, Akira YOSHIDA, |
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Summary | Full Text:PDF | |
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Vol.E75-C No.7
pp.839-843
Special SectionPAPER
Plasma-Parameter-Extraction for Minimizing Contamination and Damage in RIE Processes
Takeo YAMASHITA, Satoshi HASAKA, Iwao NATORI, Tadahiro OHMI, |
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Summary | Full Text:PDF | |
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