Design Optimization for Process-Variation-Tolerant 22-nm FinFET-Based 6-T SRAM Cell with Worst-Case Sampling Method Sangheon OHChanghwan SHIN
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 2016/05/01 Vol. E99-CNo. 5 ;
pp. 541-543 Type of Manuscript: BRIEF PAPER Category: Keyword: random variation, FinFET, SRAM, worst-case sampling,