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IEICE Trans

Keyword : multi-column-cell system

Character-Size Optimization for Reducing the Number of EB Shots of MCC Lithographic Systems
Makoto SUGIHARA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2010/05/01
Vol. E93-C  No. 5 ; pp. 631-639
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: Manufacturing Technology
Keyword: 
maskless lithography, character projection, variable-shaped beam, multi-column-cell system, character size optimization, EB shots, 
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