Keyword : multi-column-cell system


Character-Size Optimization for Reducing the Number of EB Shots of MCC Lithographic Systems
Makoto SUGIHARA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2010/05/01
Vol. E93-C  No. 5 ; pp. 631-639
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: Manufacturing Technology
Keyword: 
maskless lithographycharacter projectionvariable-shaped beammulti-column-cell systemcharacter size optimizationEB shots
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