Publication: IEICE TRANSACTIONS on Electronics Publication Date: 2020/06/01 Vol. E103-CNo. 6 ;
pp. 299-303 Type of Manuscript: Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices) Category: Semiconductor Materials and Devices Keyword: high-k, gate insulator, interfacial layer, nitridation, N2-plasma, ECR, HfN,
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 2008/07/01 Vol. E91-CNo. 7 ;
pp. 1009-1014 Type of Manuscript: Special Section PAPER (Special Section on Heterostructure Microelectronics with TWHM 2007) Category: GaN Process Technology Keyword: AlGaN/GaN HEMTs, thermal CVD SiN, current collapse, passivation film, gate insulator,
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 2004/02/01 Vol. E87-CNo. 2 ;
pp. 218-222 Type of Manuscript: Special Section PAPER (Special Section on Recent Progress in Oxide Thin Films by Sputtering) Category: Keyword: reactive sputtering, gate insulator, ZrO2, high-k,
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 2002/11/01 Vol. E85-CNo. 11 ;
pp. 1849-1853 Type of Manuscript: Special Section PAPER (Special Issue on Electronic Displays) Category: Active Matrix Displays Keyword: oxidation, poly-Si, TFT, gate insulator, SiO2,
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 1996/03/25 Vol. E79-CNo. 3 ;
pp. 398-406 Type of Manuscript: Special Section PAPER (Special Issue on Scientific ULSI Manufacturing Technology) Category: Device Issues Keyword: TFT, gate insulator, PECVD, ion flux, ion energy,