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IEICE Trans

Keyword : exposure data

High Speed Electron Beam Cell Projection Exposure System
Yoshihiko OKAMOTO Norio SAITOU Haruo YODA Yoshio SAKITANI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/03/25
Vol. E77-C  No. 3 ; pp. 445-452
Type of Manuscript:  Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
cell projection, electron beam, lithography, mask process, exposure data, 
 Summary | Full Text:PDF