Optimization of Optical Parameters in KrF Excimer Laser Lithography for Quarter-Micron Lines Pattern Keiichiro TOUNAIKunihiko KASAMA
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 1994/03/25 Vol. E77-CNo. 3 ;
pp. 425-431 Type of Manuscript: Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies) Category: Process Technology Keyword: KrF excimer stepper, modified illumination, depth of focus, simulation,
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 1993/01/25 Vol. E76-CNo. 1 ;
pp. 13-18 Type of Manuscript: INVITED PAPER (Special Issue on Opto-Electronics and LSI) Category: Opto-Electronics Technology for LSIs Keyword: photolithography, resolution, depth of focus, illumination, quadrupole illumination,