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IEICE Trans

Keyword : curing

New Technologies of KrF Excimer Laser Lithography System in 0.25 Micron Complex Circuit Patterns
Masaru SASAGO Takahiro MATSUO Kazuhiro YAMASHITA Masayuki ENDO Kouji MATSUOKA Taichi KOIZUMI Akiko KATSUYAMA Noboru NOMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/03/25
Vol. E77-C  No. 3 ; pp. 416-424
Type of Manuscript:  Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
lithography, resist, excimer laser, off-axis illumination, curing, 
 Summary | Full Text:PDF