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IEICE Trans

Keyword : SiGe gate

Characterization of Atom Diffusion in Polycrystalline Si/SiGe/Si Stacked Gate
Hideki MURAKAMI Yoshikazu MORIWAKI Masafumi FUJITAKE Daisuke AZUMA Seiichiro HIGASHI Seiichi MIYAZAKI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2005/04/01
Vol. E88-C  No. 4 ; pp. 646-650
Type of Manuscript:  Special Section PAPER (Special Section on Fundamental and Application of Advanced Semiconductor Devices)
Category: Si Devices and Processes
Keyword: 
SiGe gate, gate depletion, 
 Summary | Full Text:PDF