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IEICE Trans

Yuya TSUKAMOTO

Etching Control of HfN Encapsulating Layer for PtHf-Silicide Formation with Dopant Segregation Process
Shun-ichiro OHMI Yuya TSUKAMOTO Rengie Mark D. MAILIG 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2019/06/01
Vol. E102-C  No. 6  pp. 453-457
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
PtHf-alloy silicide, PtHf-alloy target, selective etching, contact resistivity, dopant segregation, RF magnetron sputtering, 
 Summary | Full Text:PDF
PdEr-Silicide Formation and Contact Resistivity Reduction to n-Si(100) Realized by Dopant Segregation Process
Shun-ichiro OHMI Yuya TSUKAMOTO Weiguang ZUO Yasushi MASAHIRO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2018/05/01
Vol. E101-C  No. 5  pp. 311-316
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
PdEr-alloy target, silicide, schottky barrier height, contact resistivity, RF magnetron sputtering, 
 Summary | Full Text:PDF