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IEICE Trans

Yukihisa MORIGUCHI

Micro-Raman Characterization of a Ge/Si Heterostructure Grown by Chemical Vapor Deposition
Masaya ICHIMURA Yukihisa MORIGUCHI Akira USAMI Takao WADA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/09/25
Vol. E75-C  No. 9  pp. 1056-1062
Type of Manuscript:  Special Section PAPER (Special Issue on Silicon Devices and Materials)
Category: 
Keyword: 
Raman spectroscopy, heterostructure, Ge/Si, interdiffusion, lattice-mismatch, 
 Summary | Full Text:PDF