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IEICE Trans

Yoshimi SHIRAMIZU

Copper Adsorption Behavior on Silicon Substrates
Yoshimi SHIRAMIZU Makoto MORITA Akihiko ISHITANI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/04/25
Vol. E76-C  No. 4  pp. 635-640
Type of Manuscript:  Special Section PAPER (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
metallic impurity, adsorption behavior, silicon substrate, charge transfer reaction, ion complex, 
 Summary | Full Text:PDF