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IEICE Trans

Tsuneo TERASAWA

Phase-Shifting Technology for ULSI Patterning
Tsuneo TERASAWA Shinji OKAZAKI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/01/25
Vol. E76-C  No. 1  pp. 19-25
Type of Manuscript:  INVITED PAPER (Special Issue on Opto-Electronics and LSI)
Category: Opto-Electronics Technology for LSIs
Keyword: 
optical lithography, ultralarge scale integration devices, phase shift mask, resolution, depth of focus, stepper, 
 Summary | Full Text:PDF