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IEICE Trans

Tatsuya MEGURO

Low-Temperature Polycrystalline-Silicon Thin-Film Transistors Fabricated by Continuous-Wave Laser Lateral Crystallization and Metal/Hafnium Oxide Gate Stack on Nonalkaline Glass Substrate
Tatsuya MEGURO Akito HARA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2017/01/01
Vol. E100-C  No. 1  pp. 94-100
Type of Manuscript:  PAPER
Category: Semiconductor Materials and Devices
Keyword: 
poly-Si, TFT, high-k, HfO2, CMOS, glass substrate, 
 Summary | Full Text:PDF