Akito HARA


Low-Temperature Polycrystalline-Silicon Thin-Film Transistors Fabricated by Continuous-Wave Laser Lateral Crystallization and Metal/Hafnium Oxide Gate Stack on Nonalkaline Glass Substrate
Tatsuya MEGURO Akito HARA 
Publication:   
Publication Date: 2017/01/01
Vol. E100-C  No. 1  pp. 94-100
Type of Manuscript:  PAPER
Category: Semiconductor Materials and Devices
Keyword: 
poly-SiTFThigh-kHfO2CMOSglass substrate
 Summary | Full Text:PDF

Self-Aligned Four-Terminal Planar Metal Double-Gate Low-Temperature Polycrystalline-Silicon Thin-Film Transistors for System-on-Glass
Akito HARA Shinya KAMO Tadashi SATO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2014/11/01
Vol. E97-C  No. 11  pp. 1048-1054
Type of Manuscript:  INVITED PAPER (Special Section on Electronic Displays)
Category: 
Keyword: 
poly-SiTFTdouble-gatefour-terminalsystem-on-glass
 Summary | Full Text:PDF

Self-Aligned Planar Metal Double-Gate Polycrystalline-Silicon Thin-Film Transistors Fabricated at Low Temperature on Glass Substrate
Hiroyuki OGATA Kenji ICHIJO Kenji KONDO Akito HARA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2013/02/01
Vol. E96-C  No. 2  pp. 285-288
Type of Manuscript:  BRIEF PAPER
Category: Semiconductor Materials and Devices
Keyword: 
poly-SiTFTdouble-gateglass substrate
 Summary | Full Text:PDF