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IEICE Trans

Kentaro KAWAI

Feasibility of Ultra-Thin Films for Gate Insulator by Limited Reaction Sputtering Process
Kimihiro SASAKI Kentaro KAWAI Tatsuhiro HASU Makoto YABUUCHI Tomonobu HATA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2004/02/01
Vol. E87-C  No. 2  pp. 218-222
Type of Manuscript:  Special Section PAPER (Special Section on Recent Progress in Oxide Thin Films by Sputtering)
Category: 
Keyword: 
reactive sputtering, gate insulator, ZrO2, high-k, 
 Summary | Full Text:PDF