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IEICE Trans

Keyword : selective etching

Etching Control of HfN Encapsulating Layer for PtHf-Silicide Formation with Dopant Segregation Process
Shun-ichiro OHMI Yuya TSUKAMOTO Rengie Mark D. MAILIG 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2019/06/01
Vol. E102-C  No. 6 ; pp. 453-457
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
PtHf-alloy silicide, PtHf-alloy target, selective etching, contact resistivity, dopant segregation, RF magnetron sputtering, 
 Summary | Full Text:PDF
Separation by Bonding Si Islands (SBSI) for Advanced CMOS LSI Applications
Takashi YAMAZAKI Shun-ichiro OHMI Shinya MORITA Hiroyuki OHRI Junichi MUROTA Masao SAKURABA Hiroo OMI Tetsushi SAKAI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2005/04/01
Vol. E88-C  No. 4 ; pp. 656-661
Type of Manuscript:  Special Section PAPER (Special Section on Fundamental and Application of Advanced Semiconductor Devices)
Category: Si Devices and Processes
Keyword: 
silicon on insulator (SOI) wafer, patterned SOI, SiGe, selective etching, MOSFET, 
 Summary | Full Text:PDF