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IEICE Trans

Keyword : resist selectivity

Improvement of Etching Selectivity to Photoresist for Al Dry Etching by Using Ion Implantation
Keiichi UEDA Kiyoshi SHIBATA Kazunobu MAMENO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C  No. 3 ; pp. 382-384
Type of Manuscript:  Special Section LETTER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: High-Performance Processing
Keyword: 
Photoresist, ion implantation, dry etching, resist selectivity, 
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