Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 2000/08/25
Vol. E83-C
No. 8 ;
pp. 1281-1287
Type of Manuscript:
INVITED PAPER (Special Issue on 1999 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD'99))
Category: Simulation Methodology and Environment Keyword: process modeling, device modeling, 0.13 [µm] CMOS, |