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IEICE Trans

Keyword : polysilicon

Highly Reliable Flash Memories Fabricated by in-situ Multiple Rapid Thermal Processing
Takahisa HAYASHI Yoshiyuki KAWAZU Akira UCHIYAMA Hisashi FUKUDA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/08/25
Vol. E77-C  No. 8 ; pp. 1270-1278
Type of Manuscript:  Special Section PAPER (Special Section on High Speed and High Density Multi Functional LSI Memories)
Category: Non-volatile Memory
Keyword: 
electrically erasable programmable read-only memory, metal-oxide-semiconductor structures, silicon, insulating materials and insulators, polysilicon, 
 Summary | Full Text:PDF
TiN as a Phosphorus Outdiffusion Barrier Layer for WSix/Doped-Polysilicon Structures
John M. DRYNAN Hiromitsu HADA Takemitsu KUNIO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/04/25
Vol. E76-C  No. 4 ; pp. 613-625
Type of Manuscript:  Special Section PAPER (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
barrier, outdiffusion, phosphorus, polysilicon, titanium nitride, tungsten silicide, 
 Summary | Full Text:PDF