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IEICE Trans

Keyword : pattern defect

Yield Prediction Method Considering the Effect of Particles on Sub-Micron Patterning
Nobuyoshi HATTORI Masahiko IKENO Hitoshi NAGATA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C  No. 3 ; pp. 277-281
Type of Manuscript:  Special Section PAPER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: CIM/CAM
Keyword: 
yield prediction, pattern defect, photolithography, semiconducter manufacturing, 
 Summary | Full Text:PDF
Sizes and Numbers of Particles Being Capable of Causing Pattern Defects in Semiconductor Device Manufacturing
Mototaka KAMOSHIDA Hirotomo INUI Toshiyuki OHTA Kunihiko KASAMA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C  No. 3 ; pp. 264-271
Type of Manuscript:  INVITED PAPER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: 
Keyword: 
semiconductor device manufacturing, particle, size, number, pattern defect, 
 Summary | Full Text:PDF