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IEICE Trans

Keyword : multi-layer resist

Low-Temperature Reactive Ion Etching for Multi-Layer Resist
Tetsuo SATO Tomoaki ISHIDA Masahiro YONEDA Kazuo NAKAMOTO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/04/25
Vol. E76-C  No. 4 ; pp. 607-612
Type of Manuscript:  Special Section PAPER (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
low-temperature, multi-layer resist, magnetically enhanced RIE, side wall protection, needle shaped residue, 
 Summary | Full Text:PDF