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IEICE Trans

Keyword : mask tone

Stochastic Modeling and Local CD Uniformity Comparison between Negative Metal-Based, Negative- and Positive-Tone Development EUV Resists
Itaru KAMOHARA Ulrich WELLING Ulrich KLOSTERMANN Wolfgang DEMMERLE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2022/01/01
Vol. E105-C  No. 1 ; pp. 35-46
Type of Manuscript:  PAPER
Category: Semiconductor Materials and Devices
Keyword: 
stochastic model calibration, LCDU, metal-oxide-resist, polymer, mask tone, resist, EUV, NTD, 
 Summary | Full Text:PDF