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IEICE Trans

Keyword : interfacial layer

In-Situ N2-Plasma Nitridation for High-k HfN Gate Insulator Formed by Electron Cyclotron Resonance Plasma Sputtering
Shun-ichiro OHMI Shin ISHIMATSU Yuske HORIUCHI Sohya KUDOH 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2020/06/01
Vol. E103-C  No. 6 ; pp. 299-303
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: Semiconductor Materials and Devices
Keyword: 
high-k, gate insulator, interfacial layer, nitridation, N2-plasma, ECR, HfN, 
 Summary | Full Text:PDF
Semitransparent Organic Solar Cells with Polyethylenimine Ethoxylated Interfacial Layer Using Lamination Process
Keisuke SHODA Masahiro MORIMOTO Shigeki NAKA Hiroyuki OKADA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2019/02/01
Vol. E102-C  No. 2 ; pp. 196-198
Type of Manuscript:  BRIEF PAPER
Category: 
Keyword: 
organic solar cell, bulk hetero structure, interfacial layer, lamination process, semitransparent, 
 Summary | Full Text:PDF