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IEICE Trans

Keyword : high-rate deposition

High-Rate Oblique Deposition of SiO2 Films Using Two Sputtering Sources
Yoichi HOSHI Kensuke YAGI Eisuke SUZUKI Hao LEI Akira SAKAI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2008/10/01
Vol. E91-C  No. 10 ; pp. 1644-1648
Type of Manuscript:  Special Section PAPER (Special Section on Functional Thin Films for Optical Applications)
Category: 
Keyword: 
oblique deposition, SiO2 film, reactive sputtering, high-rate deposition, alignment layer, 
 Summary | Full Text:PDF