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IEICE Trans

Keyword : high density DRAMs

Minimizing the Edge Effect in a DRAM Cell Capacitor by Using a Structure with High-Permittivity Thin Film
Takeo YAMASHITA Tadahiro OHMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/04/25
Vol. E76-C  No. 4 ; pp. 556-561
Type of Manuscript:  Special Section PAPER (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Category: Device Technology
Keyword: 
suppression of edge effect, high permittivity material, simplified DRAM cell capacitor, high density DRAMs, 
 Summary | Full Text:PDF