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IEICE Trans

Keyword : double polysilicon

Process and Device Technologies for High Speed Self-Aligned Bipolar Transistors
Tohru NAKAMURA Takeo SHIBA Takahiro ONAI Takashi UCHINO Yukihiro KIYOTA Katsuyoshi WASHIO Noriyuki HOMMA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1995/09/25
Vol. E78-C  No. 9 ; pp. 1154-1164
Type of Manuscript:  INVITED PAPER (Special Issue on Ultra-High-Speed Electron Devices)
Category: 
Keyword: 
silicon bipolar, double polysilicon, high speed, self-alignment, 
 Summary | Full Text:PDF