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IEICE Trans

Keyword : dopant segregation process

The Evaluation of the Interface Properties of PdEr-Silicide on Si(100) Formed with TiN Encapsulating Layer and Dopant Segregation Process
Rengie Mark D. MAILIG Min Gee KIM Shun-ichiro OHMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2020/06/01
Vol. E103-C  No. 6 ; pp. 286-292
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: Electronic Materials
Keyword: 
PdEr-silicide, TiN encapsulating layer, dopant segregation process, Schottky barrier height, 
 Summary | Full Text:PDF
Low Temperature Formation of Pd2Si with TiN Encapsulating Layer and Its Application to Dopant Segregation Process
Rengie Mark D. MAILIG Shun-ichiro OHMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2019/06/01
Vol. E102-C  No. 6 ; pp. 447-452
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
palladium silicide, TiN encapsulating layer, dopant segregation process, S/D engineering, Schottky barrier height, 
 Summary | Full Text:PDF