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IEICE Trans

Keyword : computer modeling

Equipment Simulation of Production Reactors for Silicon Device Fabrication
Christoph WERNER 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1999/06/25
Vol. E82-C  No. 6 ; pp. 992-996
Type of Manuscript:  INVITED PAPER (Special Issue on TCAD for Semiconductor Industries)
Category: 
Keyword: 
equipment simulation, CVD reactor, chemical vapor deposition, TCAD, computer modeling, computational fluid dynamics, silicon devices, VLSI, 
 Summary | Full Text:PDF